planar process การใช้

• Besides conformally invariant planar processes and SLE, he made fundamental contributions to several topics:
• These new FPGA families are manufactured by TSMC in its 20 nm planar process.
• Within a few years every other transistor company copied or licensed the Fairchild planar process.
• The planar process created a flat surface structure protected with an insulating silicon dioxide layer.
• The initial production stages repeated the Hoerni's planar process.
• By the mid-1960s, the planar process has become the main technology of producing transistors and monolithic integrated circuits.
• Semiconductor ICs are fabricated in a planar process which includes three key process steps imaging, deposition and etching.
• The introduction of the planar process in 1959 made transistors and ICs stable enough to be commercially useful.
• Robert Noyce showed how Hoerni s planar process could be exploited to electrically interconnect the components of an integrated circuit.
• In December 2007, an article was published by Michael Riordan on Hoerni and his planar process in " IEEE Spectrum ".
• At Fairchild Hoerni would go on to invent the planar process, which was critical in the invention of Silicon Integrated circuit by Robert Noyce.
• In 1959, developing an idea he had noted as early as 1957, Jean Hoerni submitted two patent applications describing his " Planar process ".
• On January 14, 1959, Jean Hoerni introduced his latest version of the planar process to Robert Noyce and a patent attorney John Rallza at Fairchild Semiconductor.
• On January 23, 1959, Noyce documented his vision of the planar integrated circuit, essentially re-inventing the ideas of Kilby and Lehovec on the base of the Hoerni's planar process.
• One of the ways they hoped to improve the CDC 1604 was to use better transistors, and Cray used the new silicon transistors using the planar process, developed by Fairchild Semiconductor.
• In the late 1950s, McCaldin and Hornoi devised of the silicon planar process and Kilby and Noyce established an Integrate circuit that could serve as a basic platform for Lilienfeld s design.
• Armed with this knowledge, by March 12, 1959 Hoerni made the first prototype of a planar transistor, and on May 1, 1959 filed a patent application for the invention of the planar process.
• Although semiconductors are made using an industrial technique known as a planar process, modern chips like microprocessors are already composed of as many as 20 or more layers, including up to seven layers of metal wires.
• A memo of this event by Hoerni was the basis of a patent application for the invention of a planar process, filed in May 1959, and implemented in ( the planar process ) and ( the planar transistor ).
• A memo of this event by Hoerni was the basis of a patent application for the invention of a planar process, filed in May 1959, and implemented in ( the planar process ) and ( the planar transistor ).